ALD control system

The AVT ALD system enables automation of an atomic layer deposition (ALD) process. It is a PC-based control system that is supplied with electronic hardware that is integrated with any existing ALD equipment for full automation of its process. An interactive graphical front panel enables control over, and status indication for, the ALD process. A pulse display and control window provides additional graphical information and enables the adjustment of variables to fine-tune the process. The pulse duration, interval timing, sequencing order and cycle count of the pulsed gases or precursors can be controlled through this window.

Not all ALD processes are the same and require a unique set up for each process. AVT Services provides customisation and works closely with the customer until the configuration is exactly what they need.

The AVT ALD control system utilises any choice of production-worthy recipes or experimental methods that is loaded from Excel files where the fundamental recipe parameters have been entered by the user. These can easily be created or edited by anyone with basic spreadsheet experience while having access security as optional. It will automatically run through a method or recipe with a simple Click of a button and then stores and displays any data required during a process run. The hardware to control the precursors uses embedded technology to ensure that it’s in real-time operation.